Efficient analysis a great help for etching solutions
The ICP-OES devices in the PlasmaQuant PQ 9000 series from Analytik Jena are designed to help labs overcome the challenges involved in analyzing electrolytic etching solutions.19 Dec 2018
Analyzing electrolytic etching solutions poses a particular challenge for many labs, with complex matrices from concentrated acids and spectral interferences making it really difficult to screen for possible impurities. Being able to regularly analyze the solutions is crucial to the quality of downstream production processes, since even the slightest impurities can have severe consequences. The automotive sector, the aviation industry and mechanical engineering companies all use electrolytic etching solutions to treat metal surfaces, so keeping the quality of these solutions consistent is key to producing high quality components and materials. That is why the regular detection of trace elements and matrix elements plays a decisive role in quality assurance. After all, using contaminated or inferior etching solutions results in defective surface properties on components, which impacts the quality of the end product.
The PlasmaQuant PQ 9000 series from Analytik Jena has set out to reliably and efficiently analyze electrolytic etching solutions. This ICP-OES range claims to combine the highest analytical standards, high-performance technologies and efficient data processing in one package, which has yet to be matched in terms of sensitivity, freedom from interference and precision. This helps make the analysis of sample matrices a simple routine task. The PlasmaQuant PQ 9000 and PQ 9000 Elite are particularly effective in analyzing difficult matrices. The ICP-OES devices in the series are ideal for laboratories that work with these sorts of complex samples on a daily basis.
Analytik Jena Aktiengesellschaft (07745 Jena, Germany)
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